HW401-Microfiber-Metallographic polishing pads/cloths Product features
Polishing is aimed at removing fine scratches and grinding marks from the sample to create a bright, scratch-free mirror surface for more accurate observation. Can be used with HW mono-crystalline/multi-crystalline diamond polishing liquids/pastes, cerium oxide polishing liquid, aluminum oxide polishing liquid, etc. Suitable for mirror polishing when used with abrasives 2-7um.
- This polishing pad is a high-elasticity, high-wear-resistant ultra-fine compound polishing material, ideal for the cold processing industry.
- Shore hardness: 70-80.
- There are four types of products: non-adhesive polishing fabric, rubber backed magnetic polishing cloth and rubber backed iron polishing cloth.
- Rubber backed polishing cloth is made of soft iron, if you need to order please contact customer service for price.
- The product offers two options: grooved and non-grooved.
Groove specification
Thickness | 2mm、4mm |
Groove width | 2.0±0.2mm |
Groove depth | Thin: 1.3±0.2mm Thick: 3.4±0.2mm |
Square size | 15±0.2mm |
Scope of Application
- Metal Applications: Surface polishing for stainless steel, metal alloys, and other metal materials.
- Non-metal Applications: Mirror polishing for precision chemical lenses, optical lenses, optical glass, crystals, silicon wafers, artifacts, electronic instruments, glass scratch removal, and polishing of ICD glass surfaces on mobile panels.
Product features
outer diameter: Ф200mm(Ф8in).Ф230mm(Ф9in).Ф250mm(Ф9.5in).Ф300mm(Ф12in).Ф350mm(Ф14in).Ф380mm(Ф15in).Ф600mm(Ф24in).Ф650mm(Ф26in).Ф930mm(Ф37in).Ф995mm(Ф39in) etc.Other sizes and specifications can be customized. ※Contact customer service to order, the largest toØ990mm。
1. Product advantages
Other brand products | Honway Selection (Win) | Honway product selection advantages |
Polishing fabric Double-sided adhesive layer Release paper layer
Only three-layer design | Polishing fabric Functional adhesive layer Reinforcement layer Double-sided adhesive layer Release paper layer | Not easy to wrinkle Strong water resistance Not easy to fall off High flatness |
2. How to Choose
※如何選擇拋光墊尺寸 無背膠拋光墊 > 機台盤 背膠拋光墊 = 機台盤 背磁拋光墊 = 機台盤
3. Precaution
- To achieve higher flatness, avoid placing labels or similar objects on the bottom of the pad to prevent impacting the flatness of the workpiece.
- The contact surface between the polishing pad and the machine must remain flat, clean, and dry to avoid affecting the flatness of the workpiece.
- After use, carefully remove the pad, rinse with water, and let it air dry.
- Do not bend or damage the polishing pad.
- When installing or removing, do so carefully to avoid magnetic attraction pinching your hands.