It is widely used in the grinding and precision polishing of silicon wafers, compound crystals, optical devices, LCD panels, gemstones, and metal workpieces.
| Polishing and Grinding Solution Series |
◎Monocrystalline Diamond Solution (MDS)
◎Polycrystalline Diamond Solution (PDS)
◎Nanodiamond Solution (NDS)
Monocrystalline Diamond Solution: Offers good cutting effects, suitable for grinding and polishing hard materials.
Polycrystalline Diamond Solution: Has unique toughness and self-sharpening properties, achieving high grinding force without easily scratching surfaces. It is suitable for grinding and polishing precision metal materials.
Nanodiamond Solution: Exhibits excellent dispersion stability, suitable for ultra-precision polishing.
| Monocrystalline Diamond Micropowder |
Monocrystalline diamond micropowder is produced from high-quality synthetic monocrystalline diamonds, undergoing processes such as crushing, shaping, purification, grading, and post-treatment. It is a superhard abrasive and polishing material with high hardness, strength, toughness, thermal conductivity, and good thermal stability and impact resistance.
| General Specification | Unit: Micron | ||||
| 0-0.5 (0.25um) | 0-1 (0.5um) | 0-2 (1um) | 1-3 (2um) | 2-4 (3um) | 4-6 (5um) |
| 6-12 (8um) | 8-16 (10um) | 10-20 (15um) | 15-25 (20um) | 20-30 (25um) | 20-40 (30um) |
| 35-45 (40um) | 55-65 (50um) | 50-60 (55um) | |||
※ Specifications can be customized based on customer requirements.
| Polycrystalline Diamond Micropowder |
This is a new type of abrasive material produced from high-quality diamonds through a unique process.
| General Specification | Unit: Micron | |
| 0-2 (1um) | 1-3 (2um) | 2-4 (3um) |
| 3-5 (4um) | 4-6 (5um) | 4-8 (6um) |
| 6-8 (7um) | 7-9 (8um) | 8-10 (9um) |
| 9-11 (10um) | 10-12 (11um) | |
※ Specifications can be customized based on customer requirements.
This is a new type of abrasive material produced from high-quality diamonds through a unique process.
| General Specification | Unit: Micron | |
| 0-2 (1um) | 1-3 (2um) | 2-4 (3um) |
| 3-5 (4um) | 4-6 (5um) | 4-8 (6um) |
| 6-8 (7um) | 7-9 (8um) | 8-10 (9um) |
| 9-11 (10um) | 10-12 (11um) | |
※ Specifications can be customized based on customer requirements.
| Nanodiamond |
Nanodiamonds are produced by converting free carbon generated during detonation of oxygen-balanced explosives under controlled pressure and temperature conditions into 5-20 nanometer crystalline diamond particles.
These particles are near-spherical and have a surface rich in functional groups. The specific surface area of nanodiamonds is an order of magnitude higher than that of regular diamond products. They possess both the hardness and grinding characteristics of synthetic diamonds, along with the new properties of nanomaterials.
Nanodiamonds are produced by converting free carbon generated during detonation of oxygen-balanced explosives under controlled pressure and temperature conditions into 5-20 nanometer crystalline diamond particles.
These particles are near-spherical and have a surface rich in functional groups. The specific surface area of nanodiamonds is an order of magnitude higher than that of regular diamond products. They possess both the hardness and grinding characteristics of synthetic diamonds, along with the new properties of nanomaterials.
General Specification | Unit: Nano | ||
| 50nm | 80nm | 100nm | 120nm |
| 150nm | 200nm | 300nm | 500nm |
| 800nm | 1000nm | ||
※ Specifications can be customized based on customer requirements.
Cerium Oxide Polishing Liquid |
The liquid has good particle suspension and is not prone to scratching surfaces. It is used for polishing optical glass, mobile phone glass, and more.
- Precision polishing of optical glasses and devices, such as hard disk substrates, LCD displays, etc.
- Precision polishing for optical lenses, fiber optic connectors, microcrystalline glass substrates, crystal surfaces and more.
The two colors are available in various series and specifications, allowing customers to choose according to their needs.
※ The grit size can be customized based on customer needs.
The liquid has good particle suspension and is not prone to scratching surfaces. It is used for polishing optical glass, mobile phone glass, and more.
- Precision polishing of optical glasses and devices, such as hard disk substrates, LCD displays, etc.
- Precision polishing for optical lenses, fiber optic connectors, microcrystalline glass substrates, crystal surfaces and more.
The two colors are available in various series and specifications, allowing customers to choose according to their needs.
※ The grit size can be customized based on customer needs.
| Silica Polishing Liquid |
- Suitable for silicon wafers, sapphire wafers, compound semiconductor wafers, and precision optical components.
- Ceramic and stone polishing.
- Suitable for silicon wafers, sapphire wafers, compound semiconductor wafers, and precision optical components.
- Ceramic and stone polishing.
| Alumina Polishing Liquid |
With good suspension, high purity, and fine particle size, this liquid prevents scratching on object surfaces.
Suitable for polishing optical crystals, electronic glass, and LCD glass.
- Magnetic heads, sapphires, crystals, semiconductor polishing.
- Precision polishing of hard materials such as metal, ceramics, and glass.
